X-Ray Diffraction at Elevated Temperatures von D. D. L. Chung | A Method for In Situ Process Analysis | ISBN 9780471187264

X-Ray Diffraction at Elevated Temperatures

A Method for In Situ Process Analysis

von D. D. L. Chung, Patrick W. DeHaven, H. Arnold und Debastis Ghosh
Mitwirkende
Autor / AutorinD. D. L. Chung
Autor / AutorinPatrick W. DeHaven
Autor / AutorinH. Arnold
Autor / AutorinDebastis Ghosh
Buchcover X-Ray Diffraction at Elevated Temperatures | D. D. L. Chung | EAN 9780471187264 | ISBN 0-471-18726-7 | ISBN 978-0-471-18726-4

X-Ray Diffraction at Elevated Temperatures

A Method for In Situ Process Analysis

von D. D. L. Chung, Patrick W. DeHaven, H. Arnold und Debastis Ghosh
Mitwirkende
Autor / AutorinD. D. L. Chung
Autor / AutorinPatrick W. DeHaven
Autor / AutorinH. Arnold
Autor / AutorinDebastis Ghosh
In light of the growing importance and availability of intense x-ray sources and position-sensitive detectors, this book offers comprehensive treatment of the principles, instrumentation, and applications of x-ray diffraction at elevated temperatures. Coverage explores the uses of intense x-ray sources and position-sensitive detectors for assessing these sources, and offers comparisons with complementary thermal analysis techniques (differential scanning calorimetry, thermogravimetric analysis, thermal mechanical analysis) for carrying out phase identification, texture analysis, and grain size measurement by way of in situ process analysis at elevated temperatures in a broad range of fields, including crystallography, thermal analysis, materials science, chemical and electrical analysis.