Ion Implantation and Annealing Applications, Science and Technology | Contributions from IIT School, Edition 2024 | ISBN 9783032100078

Ion Implantation and Annealing Applications, Science and Technology

Contributions from IIT School, Edition 2024

herausgegeben von Wilfried Lerch und Michael Current
Mitwirkende
Herausgegeben vonWilfried Lerch
Herausgegeben vonMichael Current
Buchcover Ion Implantation and Annealing Applications, Science and Technology  | EAN 9783032100078 | ISBN 3-032-10007-0 | ISBN 978-3-032-10007-8

Ion Implantation and Annealing Applications, Science and Technology

Contributions from IIT School, Edition 2024

herausgegeben von Wilfried Lerch und Michael Current
Mitwirkende
Herausgegeben vonWilfried Lerch
Herausgegeben vonMichael Current

This book compiles the insights and teachings from the 2024 IIT School lectures, offering a comprehensive look at ion implantation and annealing in semiconductor manufacturing. It covers the history of integrated circuits, common applications in CMOS technology, ion sources, radiation damage, annealing of materials like silicon (Si), silicon carbide (SiC) and gallium nitride (GaN), and advances in cluster ion beam technology. This edition, enriched by expert contributions, serves as an essential reference for students and professionals in materials science and microelectronics.