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„Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields. “ (Consumer Electronics Net, 15 March 2011)
A Unified Summary of the Models and Optimization Methods Used inComputational Lithography
Optical lithography is one of the most challenging areas ofcurrent integrated circuit manufacturing technology. Thesemiconductor industry is relying more on resolution enhancementtechniques (RETs), since their implementation does not requiresignificant changes in fabrication infrastructure. ComputationalLithography is the first book to address the computationaloptimization of RETs in optical lithography, providing an in-depthdiscussion of optimal optical proximity correction (OPC), phaseshifting mask (PSM), and off-axis illumination (OAI) RET tools thatuse model-based mathematical optimization approaches.
The book starts with an introduction to optical lithographysystems, electric magnetic field principles, and the fundamentalsof optimization from a mathematical point of view. It goes on todescribe in detail different types of optimization algorithms toimplement RETs. Most of the algorithms developed are based on theapplication of the OPC, PSM, and OAI approaches and theircombinations. Algorithms for coherent illumination as well aspartially coherent illumination systems are described, and numeroussimulations are offered to illustrate the effectiveness of thealgorithms. In addition, mathematical derivations of alloptimization frameworks are presented.
The accompanying MATLAB® software files for all the RETmethods described in the book make it easy for readers to run andinvestigate the codes in order to understand and apply theoptimization algorithms, as well as to design a set of optimallithography masks. The codes may also be used by readers for theirresearch and development activities in their academic or industrialorganizations. An accompanying MATLAB® software guide is alsoincluded. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide atftp://ftp. wiley. com/public/sci_tech_med/computational_lithography.
Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduatestudents, and researchers, as well as scientists and engineers inindustrial organizations whose research or career field issemiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverseproblems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in thesefields.
Optical lithography is one of the most challenging areas ofcurrent integrated circuit manufacturing technology. Thesemiconductor industry is relying more on resolution enhancementtechniques (RETs), since their implementation does not requiresignificant changes in fabrication infrastructure. ComputationalLithography is the first book to address the computationaloptimization of RETs in optical lithography, providing an in-depthdiscussion of optimal optical proximity correction (OPC), phaseshifting mask (PSM), and off-axis illumination (OAI) RET tools thatuse model-based mathematical optimization approaches.
The book starts with an introduction to optical lithographysystems, electric magnetic field principles, and the fundamentalsof optimization from a mathematical point of view. It goes on todescribe in detail different types of optimization algorithms toimplement RETs. Most of the algorithms developed are based on theapplication of the OPC, PSM, and OAI approaches and theircombinations. Algorithms for coherent illumination as well aspartially coherent illumination systems are described, and numeroussimulations are offered to illustrate the effectiveness of thealgorithms. In addition, mathematical derivations of alloptimization frameworks are presented.
The accompanying MATLAB® software files for all the RETmethods described in the book make it easy for readers to run andinvestigate the codes in order to understand and apply theoptimization algorithms, as well as to design a set of optimallithography masks. The codes may also be used by readers for theirresearch and development activities in their academic or industrialorganizations. An accompanying MATLAB® software guide is alsoincluded. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide atftp://ftp. wiley. com/public/sci_tech_med/computational_lithography.
Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduatestudents, and researchers, as well as scientists and engineers inindustrial organizations whose research or career field issemiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverseproblems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in thesefields.
