Materials Modification by High-fluence Ion Beams

Inhaltsverzeichnis

• Overview.
• High-fluence ion irradiation: an overview.
• Sputtering.
• Historical overview on the fundamentals of sputtering.
• Depth of origin of sputtered atoms.
• Magnetron sputtering: physics and design.
• On the formation and characterization of microcrystalline Si: H prepared by RF magnetron sputtering.
• Depth profiling of Ta2O5 thin layer on Ta foil by ion scattering spectrometry and ion sputtering.
• Bombardment of alkali and alkali-earth halides by ions and electrons.
• Effects of Ar+ angle-of-incidence on the etching of Si with Cl2 and low-energy Ar+ ions.
• Irradiation effects in ices by energetic ions.
• Ion formation by very high energetic ion impact on solids.
• Simulation.
• Computer simulation of stopping and sputtering.
• Computer simulation of ion-beam mixing of cobalt on silicon.
• On the fractal nature of collision cascades.
• Simple statistical models for erosion and growth.
• Defects and Disorder.
• Defects and defect processes.
• Fast-ion-induced defects in silicon studied by deep level transient spectroscopy.
• Low-energy (300 eV — 10 keV) Ar+ and Cl+ ion irradiation of (100) Si.
• The charge state of iron implanted into sapphire.
• Implantation and Mixing.
• Direct and recoil implantation, and collisional ion-beam mixing: recent low-temperature experiments.
• Mixing by defect-assisted migration of thin markers in solids.
• The TRIUMF optically pumped polarized H- ion source.
• Some high-current ion sources for materials modification.
• Compositional and Chemical Changes.
• Bombardment-induced compositional change with alloys, oxides, and oxysalts. I The role of the surface binding energy.
• Investigation of preferential sputtering mechanisms by analysing the sample surface and near-surface region with AES and ISS.
• High-fluence implantation in insulators. Part I: Compositional, mechanical, and optical changes.
• High-fluence implantation in insulators. Part II: Chemical changes.
• Electrochemical and corrosion behaviour of ion and laser-beam modified metal surfaces.
• Structural Changes.
• Ion-irradiation induced phase changes in metallic systems.
• The topography of ion-bombarded surfaces.
• Cultured blisters.
• Electronic Changes.
• Electronic properties of ion-implanted metals.
• Mechanical Changes.
• Tribology of implantation bilayers.
• Adhesive and abrasive wear study of nitrogen implanted steels.
• Effect of ?-recoil damage on the elastic moduli of zircon and tourmaline.
• Depth-resolved investigation of structural transformations and hardness variations in implanted films on bulk samples.
• Laser Processing.
• Laser etching as an alternative.
• Pulsed laser irradiation of heavily Ge implanted silicon.